I messed around a little in the lab today. As I expected, iron chloride does nothing to the oxide. Concentrated ammonium hydroxide also did nothing. Concentrated potassium hydroxide ate it off in a matter of seconds, down to bare metal. :thumb: I was out of sodium hydroxide to try, but I would expect similar results to the KOH. The KOH worked so well, I'm not even going to bother with strong acids. The resist is probably better suited for bases anyway (since that is the developer bath). Also, there won't be any acid fumes to deal with.
Tomorrow I'm going to mess around with the photo resist and see how it goes. It seems promising at this point. There are a couple of options if I tune the process right (time, temperature, etchant concentration). Before removing all the oxide, the KOH first removed a layer that had all the coloring. A whitish oxide layer remained, similar to my laser engraved panels. Then the rest of the oxide came off exposing the bare aluminum. This might give me the option of having either white or metallic lettering. Next I played around with iron chloride on the exposed aluminum. This particular alloy turned black, which is similar to what happens to some other alloys I've encountered with strong acids or bases. So depending on the alloy that Par-metal uses, this might give the option of having either black, white, or metallic lettering.
Very interesting...hopefully more results tomorrow....
-Chris